文摘
ruthenium-based厚膜电阻的退化机制研究在加速测试在各种条件下的湿度、温度和过载压力。这项研究表明,电阻的变化主要是由于水化和脱水的导电组件
. In addition to measuring resistance, the Third Harmonic Index (THI) is studied as the characteristic which may indicate the degree of various defects in resistors. A strong correlation exists between “the initial THI” and “the variation rate of resistance during an accelerated test”. A resistor which indicates a quite large initial THI shows remarkable variation of resistance, and has scratches and/or foreign substances on the surface of the thick film resistor. As a result, it becomes evident that the initial THI can be used to predict the stability of a resistor in a nondestructive test.">
ruthenium-based厚膜电阻的退化机制研究在加速测试在各种条件下的湿度、温度和过载压力。这项研究表明,电阻的变化主要是由于水化和脱水的导电组件